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吳允中

姓名： 吳允中
職稱： 副教授(光電)
最高學歷： 美國壬色列理工學院物理博士
學術專長： 半導體物理、光譜分析
辦公室電話： 2462-2192 ext.6710
E-mail： b0190@mail.ntou.edu.tw
個人網站： http://www.ios.ntou.edu.tw/teacher/teacher/index/teacher005.htm

Refereed Paper

  1. C.C. Chen, Y.-J. Wu, and L.G. Hwa, 2000, ``Temperature Dependence of Elastic Properties of ZBLAN Glasses'', Materials Chemistry and Physics, 65 (3) pp. 306-309.
  2. Zhao, Y. P., Y.-J. Wu, H. N. Yang, G. C. Wang, and T. M. Lu, 1996, ``In Situ Real-Time Study of Chemical Etching Process of Si (100) Using Light Scattering'', Appl. Phys. Lett., U.S.A., 69(2):221-223.
  3. J.C.A. Huang, Y. Liou, H.L. Liu, and Y.-J. Wu, ``Epitaxial Growth and Sturcture Characterization of Single-Crystal Co(1120) Films on Cr(100) Surfaces'', J. Cryst. Growth 139, 363-371, (1994).
  4. P.D.Persans,An Tu, Y.-J. Wu, and M. Lewis,``Size-Distribution Dependent Optical Properties of Semiconductor Microparticle Composites'', J. Opt. Soc. of America B, 6, 818, (1989).
  5. P.Persans, A. F. Ruppert, Y.-J. Wu, B. Abeles, W. Lanford, and V. Pantojas, ``Stability of Tetrahedrally Bonded Amorphous Semiconductor Multilayers'', J. Non-Cryst. Sol. 114, 771, (1989).

Conference Paper

  1. Lee, M., J. Schroeder, C. T. Moynihan, L. G. Hwa, and Y. -J. Wu, 1999, ``Spectroscopic Studies on Glasses at High Temperature: Intermediate Range Order and Boson Peaks'', APS Meeting, Atlanta, GA, U.S.A.
  2. M. Lee, J. Schroeder, Lu-Gen Hwa, and Y.-J. Wu, 2000, ``Raman Scattering in Glasses at High Temperatures: The Boson Peak and Intermediate Range Order'', APS meeting, Minneapolis, MN, U.S.A.
  3. X.-S. Zhao, P. D. Persans, J. Schroeder, and Y.-J. Wu, 1993, ``Strained Quantum Dots in Porous Silicon'' in Microcrystalline Semiconductors-Materials Science and Devices, eds. Y. Aoyagi, L. T. Canham, P. Fauchet, I. Shimizu, C. C. Tsai, Materials Research Society Symposium Proceeding Vol. 283 (1993).
  4. Y.-J. Wu, X.-S. Zhao and P. D. Persans, 1992, ``Raman Scattering in Electrochemically Prepared Porous Silicon'' in Light emission from silicon, eds. S. S. Iyer, R. T. Collins, L. T. Canham, Materials Research Society Symposium Proceeding Vol. 256 (1992).
  5. G.Yang, T. Nason and Y.-J. Wu, 1991, ``Study of Oxidation Properties of Amorphous Si:B Alloys'' in Amorphous Silicon Technology, 1991, ed. A. Madan, Materials Research Society Symposium Proceeding Vol. 219, pp. 733 (1991).
  6. P. Persans, A. F. Ruppert, Y.-J. Wu, V. Pantojas, K. Liang, and G. Hughes, 1990, ``Structural Stability of Amorphous Semiconductor Superlattices'' in Layered Structures-Heteroepitaxy, Superlattices, Strain, and Metastability, eds. L. Schowalter, B. Dodson, F. Pollak, and J. Cunningham, Materials Research Society Symposium Proceeding Vol. 160, (1990).
  7. Y.-J. Wu, P. D. Persans, B. Abeles and S.-L. Wang, 1990, ``Growth of Microcrystalline Silicon in Ultrathin Layer'', in Materials Issues In Microcrystalline Semiconductors, eds. P. M. Fauchet, K. Tanaka and C. C. Tsai, Materials Research Society Symposium Proceeding Vol. 164 (1990).
  8. G. Yang, P. Bai, Y.-J.Wu, B.Y. Tong, S.K. Wong, J. Du and I. Hill, 1989, ``Raman Studies of Microstructural Changes in Amorphous Silicon-Boron Alloys due to Annealing'' in Amorphous Silicon Technology, 1989, ed. A. Madan, Materials Research Society Symposium Proceeding Vol. 149, pp. 309 (1989).

Technical Report

  1. C.S. Chang, Y.-J. Wu, H.N. Lin, W.B. Su, W.C. Su and T.T. Tsong, 1993, ``Atomic Manipulation, Surface Diffusion and Electrochemical Studies on Gold Surfaces with STM and AFM'', J. Vac. Soc. R.O.C. 6-2, 19, (1993).